Tag: silicide

What is Zirconium Silicide?

What is it? Zirconium Silicide ? Zirconium Silicide is a zirconium/silicon intermetallic compounds. It is a ceramic material of high temperature with excellent hardness, melting point, electrical conductivity, thermal conductivity, as well as high thermal shock resistance. It is both a structural material and a new type engineering material that can be used with high-temperature, corrosive media.
The main features and benefits of Zirconium Silicide
Zirconium Silicide is a metallic gray orthorhombic, shiny crystal having a relative density of 4.8822. Zirconium Silicide is insoluble with water, mineral acids, and aqua regia. It is however, soluble in hydrofluoric Acid.
Zirconium Silicide Properties
Other Titles zirconium(IV) silicide, zirconium disilicide, ZrSi2 powder
No. 12039-90-6
Combination Formula ZrSi2
Molecular Weight 147.4
Appearance Gray Black Powder
Melting Point N/A
Boiling Point N/A
Density 4.88 g/cm3
Solubility of H2O N/A
Exact Mass 145.858557
Zirconium Silicide Zi2 Powder CAS 12039-9
Zirconium Silicide applications
It is used as a fine ceramic raw material powder to produce crucibles that are used in the production of semiconductor thin film production.
Production of Zirconium Silicium
A method to prepare zirconium silicide Nanomaterials. This involves: (1) adding 5mmol Zirconium dioxide, 50mmol of titanium powder, and 50mmol each of zirconium silicide into a 20 milliliter stainless steel Autoclave. Next, sealing the autoclave with a lid and placing it into an Electric Furnace that heats up. After the temperature rises to 600°C, the reaction continues for 40 hours before being naturally cooled to room temperatures.
(2) The reaction product was first washed in distilled water. Next, it was washed twice with dilute HCl and dehydrated Ethan. Finally, the filtrate was filtered. To obtain zirconium Silicide nanometers, the vacuum drying box was set at 60°C for 4 hours.
The main supplier of Zirconium Silicide
Tech Co., Ltd. () is a professional silicide Powder Over 12 years’ experience in chemical products development and research. We accept credit cards, T/T and West Union payments. We will ship goods overseas via FedEx, DHL and by air or sea to our customers.
You can find high-quality powdered boron carbide here Please contact us Send an inquiry


What is it? Zirconium Silicide ? Zirconium Silicide is a zirconium/silicon intermetallic compounds. It is a ceramic material of high temperature with excellent hardness, melting […]

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Chromium Silicide CrSi2 Powder CAS 12018-09-6

About Chromium Silicide CrSi2 Powder:
Silicide chromium is an inorganic compound that is chemically formula CrSi2. Silicide is a gray cubic crystal, six-square crystal system. The melting point is close to 1550 ° C, and the bond form in the crystal is similar to CR3Si, with metal gloss.
 
CrSi2 is dissolved in hydrochloric acid and royal water. The radiation of silicide is high and the resistance temperature coefficient is small. The radiation of silicide is high and the resistance temperature coefficient is small. Chromium Silicide CrSi2 IS A Narrow Gap Semiconductor, Potential P-Type Thermoelectric Material, Up to 973 K, with a bandgap of 0.30 EV. Feel free to send an inquiry to get the latest price if you would like to buy Chromium Silicide CrSi2 Powder in bulk.

Characteristics of Chromium Silicide CrSi2 Powder:
Chromium silicide CrSi2 powder (CAS 12018-09-6) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical
conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Chromium Silicide CrSi2 Powder:

Product NameMFPurityParticle SizeMelting PointDensityColor
chromium silicideCrSi299%5-10um1475℃5.5 g/cm3black


Chemical Composition of Chromium Silicide CrSi2 Powder:

CrSi2CrSiCPFeS
＞99%47.5%51.550.09%0.02%0.19%0.015%


How is Chromium Silicide CrSi2 Powder produced?
Chromium Silicide can be prepared from anhydrous chloride as a precursor, reacts with silicon at high temperatures. CrSi2 is also obtained by reducing chloride and sodium fluorosilicate at high temperatures.
 
Applications of Chromium Silicide CrSi2 Powder:
Chromium Silicide CrSi2 powder is used in a silicide chromium film, a glass coating, a silicide target, a silicide sputtering target, an N-type semiconductor.
Application of Chromium Silicide in the preparation of ceramic materials in the preparation of polycarbonate
Chromium Silicide CrSi2 promotes the cleavage reaction of PCS, increase the ceramic yield of the primary drive body,
Chromium Silicide CrSi2 can reduce the linear shrinkage of the initial target in the cracking process, improve the performance of ceramic material.

Packing & Shipping of Chromium Silicide CrSi2 Powder:
We have many different kinds of packing which depend on the chromium silicide CrSi2 powder quantity.
Chromium silicide CrSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Chromium silicide CrSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.
Chromium Silicide CrSi2 Powder CAS 12018-09-6插图
 

Chromium Silicide Properties

Other Nameschromium disilicide, chromium(II) silicide,
chromium(2+) disilicide, WSi2 powder
CAS No.12018-09-6
Compound FormulaCrSi2
Molecular Weight108.17
AppearanceGray Black Powder
Melting Point1490℃
Boiling PointN/A
Density4.91 g/cm3
Solubility in H2ON/A
Exact Mass107.894361
  
  

Chromium Silicide Health & Safety Information

Signal WordWarning
Hazard StatementsH302-H312-H317-H332
Hazard CodesXn
Risk Codes20/21/22-42/43
Safety Statements7-36
Transport InformationN/A
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About Chromium Silicide CrSi2 Powder:Silicide chromium is an inorganic compound that is chemically formula CrSi2. Silicide is a gray cubic crystal, six-square crystal system. The […]

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What is Titanium Silicide?

What is it? Titanium Silicide ? Titanium silicide, also known as TiSi2 or titanium disilicide is a chemical compound with a molecular mass of 116.1333.
Titanium Silicide: What are its characteristics?
The titanium silicide TiSi2 Powder (CAS 1203983-7) has a high melting temperature, high corrosion resistance. high oxidation resistant, and good electrical conductivity.
Titanium Silicide Property
Other Titles TiSi2 powder, titanium disilicide
No. 12039-83-7
Combination Formula TiSi2
Molecular Weight 104.04
Appearance Black Powder
Melting Point 1470 degC
Boiling Point N/A
Density 4.02 g/cm3
Solubility of H2O N/A
Exact 103.9018
Titanium Silicide Powder TiSi2 CAS 12039-83-7
Titanium Silicide:
1. Prepare a titanium silicon silicide barrier. The device prepared using the method to produce the titanium silicide barriers layer. The invention eliminates silicideblock oxide layers in the prior art. This reduces costs and reduces loss of isolation oxide film through etching. It also improves stability.
2. A Ti5Si3 particles reinforced aluminum titan carbide (Ti3AlC2) matrix composite was made. A certain amount of titanium was added to Ti3AlC2/Ti5Si3 materials. These composite materials have different volume ratios, with a 10-40% volume percentage for the titanium silicide particle reinforcing phases. The specific preparation method is as follows: first, using titanium powder, aluminum powder, silicon powder and graphite powder as raw materials, the molar ratio of Ti:Al:Si:C is 3:(1.1-x):x:(1.8~2.0), wherein x is 0.1~0.5. After mixing the raw powder by mechanical and physical methods for 824hrs, it is placed in a graphite mould with an applied pressure of 1020MPa. Next, the molar ratio Ti:Al.Si:C is 3 (1.1-x):x (1.82.0), wherein the temperature is 14001600. The sintering process takes 0.52hours, the sintering pressure 2040MPa. The invention is capable of preparing the aluminum titanium carbide/titaniumsilicide composite material with high purity, high strength and shorter processing times.
3. Preparation of functional titanium silicide coated glasses. A thin film of titanium silicide is applied to a common float-glass substrate. Between them, a thin silicon film is applied. You can make a composite of titanium silicide with silicon or add a little active carbon or Nitrogen to the film to create a composite of titanium silicide/titanium carbide, titanium nitride/titanium nitride. This will improve the mechanical strength as well as chemical resistance of the coated glasses. This new type of coated glass combines the functions dimming heat insulation as well as low radiation.
Titanium Silicide’s main supplier
Tech Co., Ltd. () is a professional silicide powder Over 12 years’ experience in chemical product development and research. We accept credit cards, T/T and West Union payments. We will ship goods overseas via FedEx, DHL and by air or sea to our customers.
You can find high-quality powdered boron carbide here Please contact us Send an inquiry


What is it? Titanium Silicide ? Titanium silicide, also known as TiSi2 or titanium disilicide is a chemical compound with a molecular mass of 116.1333. […]

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What is Titanium Silicide TiSi2 Powder?

Introduction to Titanium Silicide TiSi2 Pulver Titanium disilicide TiSi2 (the chemical formula) is an inorganic compound made of titanium and silica. Titanium silicide can be described as a dark gray square-shaped crystal. It can also be powdered and used to make target materials. It is a metal silicide. These raw materials include titanium and silicon metals. It exhibits high conductivity and high temperature stability.

Titanium Silicide TiSi2 Pulp
Among the many metal silicides, such as TiSi2, NiSi2, CoSi2, WSi2, TaSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSI2, and CoSi2, titanium silicide has excellent properties. These include high electrical conductivity. high selectivity. good process adaptability.
Titanium Silicide TiSi2 Pulp Properties
Other Names TiSi2 powder, titanium disilicide
CAS No. 12039-83-7
Formula compound TiSi2
Molecular Weight 104.04
Appearance black powder
Melting Point 1470 degC
Boiling Point N/A
Density 4.02g/cm3
Solubility of H2O N/A
Exact Mass 103.9018
Titanium Silicide TISi2 Powder CAS 12205-83-7

Related Elements
What is Si?
Silicon (atomic symbol Si; atomic number fourteen) is an element in the Period 3 unit P with an atomic mass 28.085. Silicium, which is 25.7 per cent of the earth’s crust, is the second-most abundant element after oxygen. These metals rarely occur in their pure crystal form. They are typically made from an iron/silicon alloy called ferrosilicon. Element Silicon, also known as silicon dioxide, is the main ingredient of glass. This is one the most cost-effective materials. It has excellent mechanical and optical properties, as well as thermal and electrical properties. You can dope ultra-pure silica with boron (or gallium), phosphorus or arsenic to make silicon. This is used in solar cells, transistors and other solid state devices that are widely used in electronics.

What is Ti?
Titanium, also known as atomic symbol Ti and atomic number 22, is an element in the group D of the 4th periodic with an atomic weight of 47.867. The basic form of titanium is silver-gray with a metallic appearance. Titanium is chemically similar to zirconium. This metal has the exact same number of electrons as titanium and is part of the same periodic table group. There are five naturally-occurring isotopes for titanium, 46Ti to 48Ti. The most abundant (73.8%) is 48Ti. Titanium can be found in igneous rocks as well as its sediments.

Production methods for Titanium Silicide TiSi2 Pulver
By reacting titanium hydride or titanium with silicon, you can prepare titanium disilicide.
Ti + Ti 2Si -TiSi2
It can also be ignited using aluminum powder, titanium dioxide, sulfur, and silicon dioxide.

Another option is to react titanium trichloride with silane, diclosilane, and silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4

Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is used. It is grown on silicon and other polysilicon wires with self-aligning Silicide technology. This reduces the thin layer resistance to local transistor connections. It is most commonly used in the microelectronics industry at the C54 stage.
The source, gate, leak contacts and local interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that the titanium-silicide phase is low in resistivity (20m o –cm) and doesn’t agglomerate under high-temperature treatment. For electronic applications, the Ti/Si System has two silicide layers: C49-TiSi2 with high resistivity (60-70m o.-cm) at 600-700°C and C54-TiSi2 with low resistivity (15-20m o.-cm), at 700-850°C.

Titanium Silicide TiSi2 Pulver is Main Supplier
Technology Co. Ltd. is a trusted global supplier and manufacturer of chemicals and Nanomaterials. They have over 12 years experience in producing super-high-quality chemicals, such as silicon powder.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send an inquiry. (brad@ihpa.net)

Introduction to Titanium Silicide TiSi2 Pulver Titanium disilicide TiSi2 (the chemical formula) is an inorganic compound made of titanium and silica. Titanium silicide can be […]

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Introduction to Hafnium Silicide HfSi2

What is Hafnium Diicide HfSi2? Hafnium desilicide The molecular formula Hafnium silicide has a molecular mass of 234.66. It is gray powder.
Hafnium silicide, a type a transition metal silicide as well as a class of refractory intermediatemetallic compounds. A unique combination of chemical and physical properties makes hafnium silicide a highly effective choice in fields such as bulk structural components and semiconductor components, thin films coatings, photovoltaic materials, thermoelectric materials, and other complementary metal oxide components.
Hafnium-disilicide nanomaterials exhibit special electrical and optical properties. They could also be useful in the field catalysis.

For what purpose is Hafnium disilicide HfSi2 used?
1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating
Carbon fiber reinforced carbon (Chand C), composite is a novel type of high-temperature composite that uses carbon fiber reinforcement and pyrolyticcarbon as a matrix. The composite’s excellent properties at high temperatures, ablation resistance, good friction and wear characteristics led to research by the United States on Chammer C composites for thermal structures. This work resulted in the creation of Cmax C Composites from thermal-structure materials to cauterized heat-proof materials. C/C can be used as a thermal structure material in components for gas turbine engines, spacecraft nose cone caps, wing leading edge, and many other places. Many of these parts are designed to work in extreme temperatures and oxidation conditions.

CPAC composites, however, are very easy to oxidize. They will usually not function normally in an oxygen atmosphere higher than 400. Chammer C composites need to be properly protected from oxidation. The preparation of an anti-oxidation coat is one of the most important protective measures. The results indicate that C/C composites can have an even higher ablation rate if they are coated with refractory materials Zr, Hf and Ta as well as TiB2 and other reactive metals. To understand the influence of Hf,Ta on Chand-C composites’ ablation performance, SiC–HfSi2-TaSi2 anti ablation coatings were prepared by embedding. Oxyacetylene ablation devices measured the coating’s ablation performance. Knot.

2. To create organic light-emitting gadgets
The package cover covers the light emitting layers and the cathode on anodes. A silicon carbonitride-based layer is used as a barrier to protect the silicon carbonitride. The material for the barrier layer includes silicide or metal oxides from at least one chromium, tantalum, hafnium, titanium, molybdenum, and tungsten silicide. The metal dioxide is chosen from magnesium oxide and aluminum trioxide as well as zirconium dioxide, hafnium dioxide, tantalum pentoxide, hafnium oxide, and tantalum pentoxide. The organic light-emitting device mentioned above has a longer life span.

3. To prepare silicon-germanium-alloy-based thermoelectric components
The silicon-germanium alloy-based, silicon-germanium thermoelectric element comprises an electrode layer as well as a silicon–germanium mixture-based thermal layer. A barrier layer is placed between the electrode and the silicon–germanium combination-based temperatureelectric layer. The barrier layer is made up of silicide as well as silicon nitride. The silicide is at minimum one of silicides: molybdenum silicide; tungsten silicide; cobalt silicide; nickel silicide; zirconium silicide; tantalum silicide or hafnium. The interface of silicon-germanium alloy based thermoelectric element has a well-bonded structure. It is resistant to cracks and diffusion phenomena, can withstand high temperature accelerated testing for a long time, and is thermally stable.

4. To prepare the cermet coating with high temperature resistance, oxidation resistance and other properties
The composite film has a thickness of 10 mm x 50 mm. The refractory metallic is one or many of molybdenum or tantalum as well as zirconium, zirconium or hafnium. The refractory compound is composed of silicon carbide, refractory carbide, and one or multiple of tantalum carbide, zirconium carbide, hafnium or hafnium silicide. The crystal structure of the coating is composed amorphous and/or polycrystalline nanoparticles.

Hafnium Si2 Powder Price
Price is affected by many factors, including supply and demand in a market, industry trends and economic activity.
Send us your inquiry if you’re looking for the HfSi2 latest price. (brad@ihpa.netcom)

Hafnium Silicide HFSi2 Powder Supplier
Technology Co. Ltd. is a trusted global supplier and manufacturer of chemical materials. We have more than 12 years experience in producing super-high-quality chemicals.
If you’re looking for high-quality HTMLSi2 powder please contact us and send us an inquiry. (brad@ihpa.net)

What is Hafnium Diicide HfSi2? Hafnium desilicide The molecular formula Hafnium silicide has a molecular mass of 234.66. It is gray powder. Hafnium silicide, a […]

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Tantalum disilicide Uses

What is Tantalum silicide?
Tantalum disilicide chemical formula is TaSi2. It has excellent properties such as high melting point, reduced resistivity, corrosion resistance, high temperature level oxidation resistance, and great compatibility with silicon, carbon and other matrix products.

Tantalum disilicide Uses
Tantalum disilicide is generally used in electrical burner, high temperature level architectural parts, gateway products, link circuits of incorporated circuits, high temperature oxidation resistance coverings, cermets, ceramic matrix compounds, aerospace, engines, and also other areas.

Steel silicide
Tantalum disilicide is a type of refractory steel silicide.
Steel silicide describes the hard compound formed by transition steel and silicon. Due to the big radius of silicon atoms, it can not develop interstitial compounds with shift steels, so these tough substances have secure chemical structure as well as good oxidation resistance.
Metal silicide has similar electric conductivity, heat performance, oxidation resistance and compatibility with silicon integrated circuit production procedure. Shift metal silicide can be used for low resistance entrance and also internal wiring, resistance call.

Tantalum silicide Production
The prep work approaches of tantalum silicide consist of combustion synthesis (CS) or self-propagating high temperature level synthesis (SHS), and also arc melting.

Combustion synthesis or self-propagating heat synthesis is an approach for the synthesis of intermetallic substances by the exothermic response of components/ compounds. It has the benefits of easy tools, low power consumption and also brief synthesis time. Its major drawbacks are quick response rate, difficult procedure control as well as simple existence of miscellaneous stages.
The burning synthesis of tantalum silicide needs pre-heating to initiate the response to understand the synthesis, however there is a stage apart from disilicide.

Arc melting typically takes a very long time to homogenize, as well as the loss of silicon brought on by volatilization in the melting process may result in the development of some contamination phases. Due to the fact that of its jet temperature level up to 10000 ℃ and jet quicken to 300-400m/ s, plasma splashing technology has the advantages of heat melting, rapid solidification and near-net forming, and it is not limited by shape or size, so it is easy to realize its brief process forming, so it has actually slowly created right into a brand-new sort of components developing modern technology, which has actually been used to prepare some components. Tantalum silicide powder is made into mass product by plasma splashing modern technology, which calls for high pureness tantalum silicide powder as basic material. As a result, exactly how to obtain high purity tantalum silicide powder (without impurity stage formation) ends up being the key.

Tantalum silicide Cost
The cost is influenced by many elements including the supply and also need on the market, industry trends, financial activity, market sentiment, and also unanticipated events.
If you are seeking the newest TaSi2 powder price, you can send us your questions for a quote. (brad@ihpa.net)

Tantalum silicide Provider
Innovation Co. Ltd. () is a trusted tantalum silicide producer as well as tantalum silicide vendor with over 12-year-experience. We deliver our items throughout the world.

If you are searching for top notch TaSi2 powder, please do not hesitate to contact us and send out an inquiry. (brad@ihpa.net)