Tag: Si3N4 powder

Common Preparation Methods of Silicon Nitride Powder

What is silicon nitride (SiN)?

Silicon nitride has the chemical formula Si3N4. It is a ceramic material of high strength, inherent lubricity and wear resistance. It is an atomic-crystal and resists oxidation in high temperatures. It is also resistant to the effects of both heat and cold. It will not break if it’s heated to over 1000degC and then quickly cooled, followed by a rapid heating. The excellent characteristics of silicon-nitride ceramic are the reason why it is used in many mechanical components, such as bearings and turbine blades. It can also be used to produce mechanical seal rings, permanent moldings, and more. When silicon nitride is used for the heating surfaces on engine components, it can not only improve the quality of an engine, but also fuel efficiency and thermal efficiency. China, Japan, the United States and other countries are developing such engines.

How to prepare silicon nitride

It is widely used in China. The method is simple and inexpensive. Metal silicon powder is heated with nitrogen or ammonia in an atmosphere. The metal silicon and nitrogen source directly react and form silicon nitride.


This method is cost-effective and requires little equipment. However, the metal silica powder nitridation is an exothermic process. If heat is not released at the right time during the process of nitriding, metal silicon powder nearby will melt and cause problems. The result of the nitriding. The nitriding process is controlled by the temperature, speed and particle size. The synthesised silicon nitride comes in a block-like shape. The silicon nitride must be prepared by other methods such as ball milling, which are not very efficient and introduce impurities into the process.


In the presence of high-temperature nitrogen, SiO2 is reduced with carbon powder. SiO2 is reduced to gas-phase SiO first, and the gas-phase SiO reacts to nitrogen in atmosphere to produce silicon nitride.


Thermal decomposition uses SiCl4 to react at low temperature with ammonia gas in order to obtain solid imino silica (Si(NH2)), or amino silicon(Si(NH2)4). These two silicides may be decomposed under high temperature conditions to yield nitride Silicon. This method can be used to prepare large quantities of high purity silicon nitride in a very short time. This method can produce silicon nitride that is high in purity and has uniform particle sizes. This method is currently the most popular method for commercial production high-purity, high-quality silicon powder.


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What is silicon nitride (SiN)? Silicon nitride has the chemical formula Si3N4. It is a ceramic material of high strength, inherent lubricity and wear resistance. […]

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What is Silicon Nitride Si3N4 Powder?

Introduction to Silicon Nitride si3N4 Powder Silicon nitride This is an inorganic compound, with the chemical formula Si3N4. The relative molecular mass of this substance is 140.28. Gray, off-white, or white.

Physicochemical properties of Silicon Nitride Si3N4 Pulp
Si3N4 has high-temperature insoluble properties. It exhibits high-temperature creep resistance. Hexagonal system. Crystals are hexagonal. The Si3N4 density obtained using the reaction sintering process is 1.8-2.7% g/cm3, and that of Si3N4 by hot-pressing is 3.12-3.22g/cm3. Mohs hardness (99.5), Vickers hardness (2200) and microhardness (32220MPa) are all 99.5. The melting point of the metal is 1900 when it is under pressure. At atmospheric pressure, it typically decomposes around 1900. Specific heat capacity is 0.71J/g*K. The heat of forming is -751.57kJ/mol. The thermal conductivity of the material is (2-155) W/(m*K). The linear expansion coefficient is 2.8~3.2×10-6/(20~1000).
Water insoluble. Insoluble in water. The temperature at which oxygenation starts in the air is 13001400. The specific volume resistance of the air is 1.4×105 *m for 20 and 4×108*m for 500. The elastic modulus measures 2842046060MPa. Reaction sintering results in a compressive strength 490MPa. It reacts with dicalcium dialyzide at 1285 to form calcium diazide. At 600, it is reduced to a transition metal and released nitrogen oxides. The bending strength of the silicon halide is 147MPa. It can be made by heating silica powder in nitrogen, or reacting with ammonia to make silicon halide. The resistance is between 1015-1016O.cm. It can be used in high-temperature ceramic materials.
Other than hydrofluoric acid or hot phosphoric acid silicon nitride doesn’t react with any inorganic acids. It also has high corrosion resistance.
Silicon Nitride Si3N4 Powder Properties
Other Names silicon (IV), nitride
CAS No. 12033-89-5
Formula compound Si3N4
Molecular Weight 140.28
Appearance From white powder to gray powder
Melting Point 1900degC
Boiling Point N/A
Density 2.2-3.5g/cm3
Solubility of H2O Insoluble
Exact Mass 139.943
Silicon Nitride Si3N4 Powder CAS 12033-89-5


Silicon Nitride Si3N4 Pulverization
High thermal stability, high oxidation resistance and high dimensional accuracy are some of the benefits of silicon nitride clay material. The covalent compound silicon nitride has a high bond strength and will form an oxygen film in the atmosphere, which gives it excellent chemical stability. Silicon nitride can not be oxidized below 1200. A protective film can also be formed between 1200 and 1600 to stop further oxidation. Silicon nitride does not become infiltrated, corroded, or infiltrated with aluminum, lead or tin, silver or brass, as well as many other molten alloys and metals. However it can be corroded and contaminated by magnesium, nickelchromium alloy and other molten liquids.
Silicon nitride ceramic materials are suitable for use in high-temperature engineering components , Advanced refractory for the metallurgical sector , Corrosive-resistant components Sealing components in the chemical, machining, and cutting industries.
Silicon nitride is a strong bond material that forms with silicon carbide (alumina), thorium oxide, boron and boron nitride, among others.
Additionally, silicon nitride may be used in solar cells . After the silicon-nitride nitride is plated with the PECVD process, it can be used to reduce incident light reflections. In the deposition process for a silicon Nitride film, the hydrogen atom from the reaction product enters silicon nitride wafer and silicon nitride movie, where it plays a role as a passivation problem. The ratio of silicon nitrogen atoms to silicon nitride is not strictly 4:3, but can fluctuate depending on different technological conditions. Different atomic proportions correspond to different physical characteristics of the film.
You can also use it in Ultra-high temperatures gas turbines, aircraft engines and electric furnaces , etc.

Main supplier of Silicon Nitride Powder Si3N4
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Introduction to Silicon Nitride si3N4 Powder Silicon nitride This is an inorganic compound, with the chemical formula Si3N4. The relative molecular mass of this substance […]

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