What is Silicon Nitride?

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What is it? Silicon Nitride ? Silicon nitride can be described as an inorganic substance that has the chemical formula Si3N4. It is an important structural ceramic material, with high hardness and wear resistance. It is also resistant to heat and cold shock. It can be heated to over 1000°C in the air. If it is quickly cooled, it will not break. This is because of the exceptional properties of silicon-nitride ceramics. It is used often to produce mechanical components, such as bearings. The heat-receiving area of engine components can be made from silicon nitride clays, which are heat-resistant and hard to heat transfer. This will not only increase the quality of the engines but also save fuel. Similar engines have been created in China and Japan.
Silicon Nitride’s main features
The relative molecular weight is 140.28. You can choose from grey, off-white or white. It is high temperature insoluble, has no melting points, and has strong high temperatures creep resistance. The melting point of reaction sintered silicone nitride is over 1800°C; hexagonal system. The crystals are hexahedral. Si3N4 prepared through reaction sintering methods has a density of 1.82.7g/cm3. Si3N4 made by hot pressing method has a density of 3.123.22g/cm3. Mohs hardness 9.9, Vickers hardness 2.20, and microhardness 3.123.22g/cm3 are the Mohs hardness. Melting point 1900 (under pressure). Normal pressure usually causes it to decompose at around 1900°C. Specific heat capacity 0.71J/g*K The heat of forming is -751.57kJ/mol. The thermal conductivity of the material is (2-155) W/(m*K). The coefficient of linear expansion is 2.8~3.2×10-6/(20~1000). It is not soluble when water is used. Hydrofluoric Acid makes it soluble. At 1300 1400 the temperature at which oxygenation begins in the air. The specific volume resistance of the air is 1.4×105 *m for 20degC, and 4×108 *m for 500degC. The elastic modulus measures 2842046060MPa. The reaction sintered results in a 490MPa compressive force. It reacts at 1285 with dicalcium dinitride, forming calcium silicide. The transition metal is then reduced to 600 and the nitrogen oxides released. It has a bending strength of 147 MPa. It can be made by heating silicon powder with nitrogen or reacting silica halide in ammonia. The resistance is between 10 and 15 to 16 O.cm. Useful for high temperature ceramic raw materials.
Silicon Nitride Properties
Other Titles silicon (IV), nitride
No. 12033-89-5
Combination Formula Si3N4
Molecular Weight 140.28
Appearance White powder to gray powder
Melting Point 1900 degC
Boiling Point N/A
Density 2.2-3.5 g/cm3
Solubility of H2O Insoluble
Electrical Resistivity 11 to 12 10x O.m
Specific heat 720 to 800 J/kg/K
Poisson’s Ratio 0.24 to $0.27
Thermal Conductivity 12 to 31 W/m/K
Thermal Expansion 2.5 to 3.0 um/m-K
Young’s Modulus 140 to 315 GPa
Exact 139.943 g/mol
Silicon Nitride Si3N4 Powder CAS 12033-89-5
Silicon Nitride’s applications
1. High thermal stability, high oxidation resistance, high dimensional accuracy and strong thermal stability are all characteristics of silicon nitride ceramic material. Silicon nitride, a covalent chemical compound with high bond strengths and the ability to form an oxide protective coating in the air, has excellent chemical stability. It is resistant to oxidization and can be infiltrated or damaged by many molten metals and alloys, including aluminum, lead, zinc, silver, nickel, etc. But it can also be corroded from molten liquids, such as magnesium and nickel-chromium alliance, as well as stainless steel. Silicon nitride ceramic materials are used in high temperature engineering components, advanced materials in metallurgical industries, corrosion-resistant parts and sealing components in the chemical sector, as well cutting tools and tools in the machining industry.
Because silicon nitride forms strong bonds with aluminum oxide, silicon carbide, silicon carbide, thorium dioxide, boron and thorium dioxide it can be used to modify different ratios.
2. Also, solar cells can be made from silicon nitride. After the silicon-nitride coating is applied using the PECVD method it can be used as an antireflection film to reduce reflections of incident light. During the deposition of the silicon silicon nitride movie, hydrogen atoms from the reaction product enter both the silicon film and the silicon wafer. This role was to prevent passivation. Here, the atomic ratio of silicon Nitride to silicon Nitride is not exactly 4:3. It fluctuates between different process conditions and different physical properties.
3. For ultra-high temperatures gas turbines, aircraft engines and electric furnaces.
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